Carbon tetrafluoride, also known as tetrafluoromethane, is regarded as an inorganic compound. Plasma etching process for various integrated circuits, also used as laser gas and refrigerant. It is stable at normal temperature and pressure, but avoid contact with strong oxidants, inflammable or combustible materials. Carbon tetrafluoride is a non-flammable gas. If it encounters high heat, it will increase the pressure in the container, leading to the risk of cracking and explosion. Normally, it will only interact with liquid ammonia-metallic sodium reagent at room temperature.

Carbon tetrafluoride dosage in the microelectronics industry is the largest plasma etching gas, can be widely used in silicon, silicon dioxide, phosphorus silicon thin film materials such as glass etching, surface cleaning in electronic devices, solar cell production, laser technology, gas phase insulation, cryogenic refrigeration, leak inspection agent, printed circuit in the production of detergent, etc all have a large number of applications.