One of the applications of silane is amorphous semiconductor amorphous silicon. Compared with monocrystalline semiconductor materials, amorphous silicon is characterized by its easy formation of extremely thin (about 10nm thickness) large-area devices. The substrate can be glass, stainless steel, or even plastic, and the surface can be flat or curved. Therefore, various devices with excellent performance can be made.

Nowadays, silane has become the most important special gas used in semiconductor microelectronics process. It is used in the preparation of various microelectronic films, including monocrystalline film, microcrystalline, polycrystalline, silicon oxide, silicon nitride, metal silicide, etc. The microelectronic applications of silane are also developing in depth: low temperature epitaxy, selective epitaxy and heteroepitaxy. Not only for silicon devices and silicon integrated circuits, but also for compound semiconductor devices (gallium arsenide, silicon carbide, etc.). It is also used in the preparation of superlattice quantum well materials. Silane is used in almost all advanced integrated circuit production lines in modern times. The purity of silane is greatly related to the performance and yield of the device, and more advanced devices need higher purity silane (including ethanoland propylsilane).